Next-Gen Nanofabrication, Lithography, Thin Films & NanoDevices
Engineering the Future—One Nanometer at a Time
About This Course
Nanofabrication lies at the heart of modern technologies such as semiconductors, MEMS/NEMS, nanoelectronics, photonic devices, biosensors, and quantum devices. Techniques like photolithography, electron-beam lithography, thin-film deposition, and etching allow precise control of materials and structures at the nanometer scale. Understanding these processes is essential for designing reliable, scalable, and high-performance nanodevices.
This workshop introduces next-generation nanofabrication workflows, covering lithography techniques, thin-film growth methods, pattern transfer, and device integration. Participants will explore how material choice, process parameters, and fabrication strategies influence device performance. Emphasis is placed on process understanding, design logic, and application pathways, making the workshop valuable for both researchers and industry-oriented learners.
Aim
This workshop aims to provide in-depth knowledge of advanced nanofabrication techniques used to design and manufacture next-generation nano- and micro-scale devices. Participants will learn how lithography, thin-film deposition, and nanoscale patterning enable modern electronics, photonics, sensors, and biomedical devices. The program connects fabrication physics with practical device applications. It is designed to bridge academic research and industrial nanomanufacturing.
Workshop Objectives
- Understand fundamentals of nanofabrication and lithography techniques.
- Learn thin-film deposition methods and material selection strategies.
- Explore nanoscale patterning, etching, and process integration.
- Analyze fabrication challenges such as defects, yield, and scalability.
- Connect fabrication workflows to real-world nanodevice applications.
Workshop Structure
Day 1: Nanofabrication Foundations & Lithography Process Chain
- contamination control, classes, safety, process documentation
- Top-down vs bottom-up fabrication; typical nano-device process flows
- Substrates & wafer prep: silicon, glass, polymers; cleaning (RCA basics), dehydration bake, HMDS priming
- Lithography overview: optical photolithography vs e-beam lithography vs nanoimprint lithography
- Photoresists: positive/negative resists, spin coating, soft/hard bake, exposure, development
- Critical concepts: resolution, depth of focus, alignment/overlay, CD control, proximity effects
- Tools: Process flowcharts, mask design basics, lithography recipes, defect catalogs
Day 2: Thin Films, Deposition, Pattern Transfer & Etching
- Thin-film fundamentals: thickness, stress, adhesion, conformity, grain structure, roughness
- Deposition techniques: PVD (sputtering/evaporation), CVD/PECVD, ALD—selection criteria and trade-offs
- Lift-off vs etch-back; hard masks; resist profiles for clean lift-off
- Etching: wet etch vs dry etch (RIE/ICP); selectivity, anisotropy, etch rate control
- Interface engineering: diffusion barriers, adhesion layers (Ti/Cr), contact formation basics
- Process integration case study: metal interconnects or thin-film transistor stack walkthrough
- Tools: Deposition parameter windows, etch recipes, stack engineering checklists
Day 3: NanoDevices, Metrology, Yield Thinking & Research-Grade Reporting
- Nanodevice categories: nanosensors, thin-film transistors, photonic devices, MEMS/NEMS overview
- Electrical basics for devices: contacts (ohmic/Schottky), I–V curves, leakage, breakdown concepts
- Metrology & characterization: profilometry/ellipsometry, AFM, SEM, XRD, Raman, four-point probe, sheet resistance
- Defects & troubleshooting: pinholes, edge beads, resist scumming, footing, redeposition, delamination, cracking
- Yield and process control: repeatability, SPC basics, run sheets, process logs, DOE intro
- Mini-project: design a design-to-device process flow (mask → lithography → deposition → etch → metrology → device test) + final report format
- Tools: SPC/DOE templates, reporting structure, reproducibility checklists
Who Should Enrol?
- Doctoral Scholars & Researchers: PhD candidates seeking to integrate computational workflows into their molecular research.
- Postdoctoral Fellows: Early-career scientists aiming to enhance their data-driven publication profile.
- University Faculty: Professors and HODs interested in modern bioinformatics pedagogy and tool mastery.
- Industry Scientists: R&D professionals from the Biotechnology and Pharmaceutical sectors transitioning to genomic-driven discovery.
- Postgraduate Students: Final-year PG students looking for specialized research-grade exposure beyond standard curricula.
Important Dates
Registration Ends
02/06/2026
IST 7:00 PM
Workshop Dates
02/06/2026 – 02/08/2026
IST 08:00 PM
Workshop Outcomes
Participants will be able to:
- Explain key nanofabrication and lithography techniques.
- Understand thin-film growth and pattern transfer processes.
- Relate fabrication parameters to nanodevice performance.
- Identify suitable fabrication routes for different applications.
- Communicate fabrication concepts confidently for research or industry roles.
Fee Structure
Student Fee
₹1799 | $70
Ph.D. Scholar / Researcher Fee
₹2799 | $80
Academician / Faculty Fee
₹3799 | $95
Industry Professional Fee
₹4799 | $110
What You’ll Gain
- Live & recorded sessions
- e-Certificate upon completion
- Post-workshop query support
- Hands-on learning experience
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